Coated article with low-E coating having absorbing layers for low film side reflectance and low visible transmission

ABSTRACT

Absorbing layers of a low-emissivity (low-E) coating are designed to cause the coating to have a reduced film side reflectance which is advantageous for aesthetic purposes. In certain embodiments, the absorbing layers are metallic or substantially metallic (e.g., NiCr or NiCrN x ) and are each provided between first and second nitride layers (e.g., silicon nitride based layers) in order to reduce or prevent oxidation of the absorbing layers during optional heat treatment thermal tempering, heat bending, and/or heat strengthening). Coated articles according to certain example embodiments of this invention may be used in the context of insulating glass (IG) window units, other types of windows, etc.

This application is a continuation of application Ser. No. 15/924,401,filed Mar. 19, 2018 (now U.S. Pat. No. 10,112,866), which is acontinuation of application Ser. No. 15/098,344, filed Apr. 14, 2016(now U.S. Pat. No. 9,919,961), which is a continuation of applicationSer. No. 14/852,834, filed Sep. 14, 2015 (now U.S. Pat. No. 9,328,017),which is a continuation of application Ser. No. 13/606,276, filed Sep.7, 2012 (now U.S. Pat. No. 9,150,003), the entire disclosures of whichare all hereby incorporated herein by reference in this application.

This invention relates to a coated article including a low-E coating. Incertain example embodiments, absorbing layers of the low-E coating arepositioned/designed to cause the coating to have both (i) a low visibletransmission (e.g., no greater than 50%, more preferably no greater than40%, and most preferably no greater than 35%), and (ii) a reducedvisible film side reflectance. An absorbing layer May be provided in anupper stack and another absorbing layer may be provided in a lower stackof the low-E coating. In certain example embodiments, the absorbinglayers are metallic or substantially metallic and are each providedbetween first and second nitride layers (e.g., silicon nitride basedlayers) in order to reduce or prevent oxidation of the absorbing layersduring optional heat treatment (e.g., thermal tempering, heat bending,and/or heat strengthening) and/or manufacturing thereby permittingpredictable coloration and optical characteristics to be achieved.Coated articles according to certain example embodiments of thisinvention may be used in the context of insulating glass (IG) windowunits, vehicle windows, other types of windows, or in any other suitableapplication.

BACKGROUND OF THE INVENTION

Coated articles are known in the art for use in window applications suchas insulating glass (IG) window units, vehicle windows, and/or the like.It is known that in certain instances, it is desirable to heat treat(e.g., thermally temper, heat bend and/or heat strengthen) such coatedarticles for purposes of tempering, bending, or the like in certainexample instances. Heat treatment of coated articles typically requiresuse of temperature(s) of at least 580 degrees C., more preferably of atleast about 600 degrees C. and still more preferably of at least 620degrees C. Such high temperatures (e.g., for 5-10 minutes or more) oftencause coatings to break down and/or deteriorate or change in anunpredictable manner. Thus, it is desirable for coatings to be able towithstand such heat treatments (e.g., thermal tempering) if desired, ina predictable manner that does not significantly damage the coating.

In certain situations, designers of coated articles strive for acombination of desirable visible transmission, desirable color, lowemissivity (or emittance), and low sheet resistance (R_(s)).Low-emissivity (low-E) and low sheet resistance characteristics permitsuch coated articles to block significant amounts of IR radiation so asto reduce for example undesirable heating of vehicle or buildinginteriors. Often, more IR radiation being blocked (including reflected)is accompanied by less visible transmission.

U.S. Pat. No. 7,597,965 discloses a low-E coating with an NiCr absorberlayer in the lower dielectric stack. However, the example coating in the'965 patent is designed for a high visible transmission, and indeed hasa visible transmission (T_(vis), or TY) of 59%. Lower visibletransmissions are often desirable. For example, it is often desirablefor aesthetic and/or optical purposes to provide coated articles(including low-E coatings) having visible transmissions of no greaterthan 50%, more preferably no greater than 40%, and sometimes no greaterthan 35%. However, when visible transmission of a coated article isreduced via a low-E coating design, the film side reflectance of thecoating typically increases.

U.S. Pat. No. 7,648,769 discloses a low-E coating with an NiCr absorberlayer provided in the middle dielectric stack, but not in the upper andlower dielectric stacks of the coating (e.g., see FIG. 1 of the '769patent). Example 1 in the '769 patent realizes, measured monolithically,a visible transmission of 54.5% and a film side reflectance of 19.5%,and when measured in an insulating glass (IG) window unit the valueschange to a visible transmission of 50% and a film side reflectance of23%. In a similar manner, Example 2 in the '769 patent realizes,measured monolithically, a visible transmission of 67.5% and a film sidereflectance of 11.5%, and when measured in an insulating glass (IG)window unit the values change to a visible transmission of 62% and afilm side reflectance of 17%. It will be appreciated that the examplesin the '769 patent do not realize a simultaneous combination of both (i)low visible transmission, and (ii) low film side reflectance. Instead,the examples in the '769 patent teach that when visible transmissiongoes down, film side reflectance goes up.

It will also be explained herein, in the detailed description section,that providing an absorber layer only in the middle dielectric stack ofa low-E coating having a visible transmission of about 40% results in anundesirably high visible film side reflectance (R_(f)Y) of over 30%.

Thus, it will be appreciated that it has been difficult to achievecoater articles, including low-E coatings, having a combination of both(i) desirably low visible transmission, and (ii) low film sidereflectance. It will be apparent to those skilled in the art that thereexists a need in the art for a coated article having low emissivity (orlow sheet resistance) and a combination of both low visible transmission(e.g., no greater than 50%, more preferably no greater than about 40%,and most preferably no greater than about 35%) and low film sidereflectance.

BRIEF SUMMARY OF EXAMPLE EMBODIMENTS OF THE INVENTION

A coated article includes a low-E coating. In certain exampleembodiments, absorbing layers in the low-E coating arepositioned/designed to cause the low-E coating to have both (I) a lowvisible transmission (e.g., no greater than 50%, more preferably nogreater than 40%, and most preferably no greater than 35%), and (ii) lowvisible film side reflectance which is advantageous for aestheticpurposes. An absorbing layer is be provided in an upper stack of thelow-E coating and another absorbing layer is provided in a lower stackof the low-E coating, and in certain double-silver embodiments nosimilar absorbing layer is provided in the center stack of the low-Ecoating. The absorbing layers are metallic or substantially metallic(e.g., NiCr or NiCrN_(x)), and in certain example embodiments are eachprovided between first and second nitride layers (e.g., silicon nitridebased layers) in order to reduce or prevent oxidation of the absorbinglayers during optional heat treatment (e.g., thermal tempering, heatbending, and/or heat strengthening) and/or manufacturing therebypermitting predictable coloration and optical characteristics to beachieved. It has been found that the use of such absorbing layers in thetop and bottom portions of the coating, but not in the middle dielectricstack of the coating between the silver layers, surprisingly andunexpectedly allows for a combination of low visible transmission andlow film side reflectance to be simultaneously realized. In certainexample embodiments, the coated article's visible film side reflectance(RfY) may be less than its visible glass side reflectance (RgY), in IGand/or monolithic applications. Coated articles according to certainexample embodiments of this invention may be used in the context of IGwindow units, vehicle windows, other types of windows, or in any othersuitable application.

In certain example embodiments of this invention, there is provided acoated article including a coating supported by a glass substrate, thecoating comprising: first and second infrared (IR) reflecting layers,wherein said IR reflecting layers are spaced apart from one another byat least one dielectric layer that is located therebetween, and whereinthe first IR reflecting layer is located closer to the glass substratethan is the second IR reflecting layer; a first substantially metallicor metallic absorption layer located such that the first absorptionlayer is located between the glass substrate and the first IR reflectinglayer, a second substantially metallic or metallic absorption layerlocated such that both the first and second IR reflecting layers arelocated between the glass substrate and the second absorption layer, andwherein the first absorption layer and the second absorption layer areeach sandwiched between and contacting dielectric layers comprisingsilicon nitride.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross sectional view of a coated article according to anexample embodiment of this invention.

FIG. 2 is a cross sectional view showing the coated article of FIG. 1provided in an IG window unit according to an example embodiment of thisinvention.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS OF THE INVENTION

Coated articles herein may be used in applications such as IG windowunits, vehicle windows, monolithic architectural windows, residentialwindows, and/or any other suitable application that includes single ormultiple glass substrates.

In certain example embodiments of this invention, the coating includes adouble-silver stack (as shown in FIG. 1), although this invention is notso limited in all instances.

For example, in certain example embodiments of this invention, heattreated or non-heat-treated coated articles having multiple IRreflecting layers (e.g., two spaced apart silver based layers) arecapable of realizing a sheet resistance (R_(s)) of less than or equal to3.0 (more preferably less than or equal to 2.5, even more preferablyless than or equal to 2.1, and most preferably less than or equal to2.0). The terms “heat treatment” and “heat treating” as used herein meanheating the article to a temperature sufficient to achieve thermaltempering, heat bending, and/or heat strengthening of the glassinclusive article. This definition includes, for example, heating acoated article in an oven or furnace at a temperature of least about 580degrees C., more preferably at least about 600 degrees C., for asufficient period to allow tempering, bending, and/or heatstrengthening. In certain instances, the HT may be for at least about 4or 5 minutes. The coated article may or may not be heat treated indifferent embodiments of this invention.

FIG. 1 is a side cross sectional view of a coated article according toan example non-limiting embodiment of this invention. The coated articleincludes substrate 1 (e.g., clear, green, bronze, or blue-green glasssubstrate from about 1.0 to 10.0 mm thick, more preferably from about1.0 mm to 3.5 mm thick), and low-E coating (or layer system) 30 providedon the substrate 1 either directly or indirectly. The coating (or layersystem) 30 includes, for example: bottom dielectric silicon nitridelayer 3 which may be Si₃N₄, of the Si-rich type for haze reduction, orof any other suitable stoichiometry silicon nitride in differentembodiments of this invention, metallic or substantially metallicabsorbing layer 4 (e.g., of or including NiCr, NiCrN_(x), or the like),additional dielectric silicon nitride layer 5 which may be Si₃N₄, of theSi-rich type for haze reduction, or of any other suitable stoichiometrysilicon nitride, optional dielectric layer 6 of or including titaniumoxide or any other suitable material, first lower contact layer 7 (whichcontacts bottom IR reflecting layer 9), first conductive and preferablymetallic or substantially metallic infrared (IR) reflecting layer 9,first upper contact layer 11 (which contacts layer 9), dielectric layer13, another silicon nitride based and/or inclusive layer 14, tin oxideinclusive based and/or inclusive interlayer 15, second lower contactlayer 17 (which contacts IR reflecting layer 19), second conductive andpreferably metallic or substantially metallic IR reflecting layer 19,second upper contact layer 21 (which contacts layer 19), dielectriclayer 23, dielectric silicon nitride layer 24 which may be Si₃N₄, of theSi-rich type for haze reduction, or of any other suitable stoichiometrysilicon nitride in different embodiments of this invention, metallic orsubstantially metallic absorbing layer 25 (e.g., of or including NiCr,NiCrN_(x), or the like), and overcoat dielectric silicon nitride layer26 which may be Si₃N₄, of the Si-rich type for haze reduction, or of anyother suitable stoichiometry silicon nitride. The “contact” layers 7,11, 17 and 21 each contact at least one IR reflecting layer (e.g., layerbased on Ag). The aforesaid sputter-deposited layers 3-26 make up low-E(i.e., low emissivity) coating 30 that is provided on glass or plasticsubstrate 1.

In monolithic instances, the coated article includes only one glasssubstrate 1 as illustrated in FIG. 1. However, monolithic coatedarticles herein may be used in devices such as laminated vehiclewindshields, IG window units, and the like. As for IG window units, anIC window unit may include two spaced apart glass substrates. An exampleIG window unit, is illustrated and described, for example, in U.S.Patent Document No, 2004/0005467, the disclosure of which is herebyincorporated herein by reference. FIG. 2 shows an example IG window unitincluding the coated glass substrate 1 shown in FIG. 1 coupled toanother glass substrate 2 via spacer(s), sealant(s) 40 or the like, witha gap 50 being defined therebetween. This gap 50 between the substratesin 1G unit embodiments may in certain instances be filled with a gassuch as argon (Ar). An example IG unit may comprise a pair of spacedapart clear glass substrates each about 3-4 mm thick, one of which iscoated with a coating 30 herein in certain example instances, where thegap 50 between the substrates May be from about 5 to 30 mm, morepreferably from about 10 to 20 mm, and most preferably about 16 mm. Incertain example instances, the coating 30 may be provided on theinterior surface of either substrate facing the gap (the coating isshown on the interior major surface of substrate 1 in FIG. 2 facing thegap 50, but instead could be on the interior major surface of substrate2 facing the gap 50). Either substrate 1 or substrate 2 may be theoutermost substrate of the IG window unit at the building exterior(e.g., in FIG. 2 the substrate 1 is the substrate closest to thebuilding exterior).

Absorption layer 4 is, in certain example embodiments of this invention,located between and contacting nitride based dielectric layers 3 and 5.In certain example embodiments, each of layers 3 and 5 surrounding theabsorption layer 4 is a nitride layer and is substantially or entirelynon-oxidized. Likewise, absorption layer 25 is, in certain exampleembodiments of this invention, located between and contacting nitridebased dielectric layers 24 and 26. In certain example embodiments, eachof layers 24 and 26 surrounding the absorption layer 25 is a nitridelayer and is substantially or entirely non-oxidized. Optionally, theoutermost portion of layer 26 may be oxided if it is the outermost layerof the coating 30 and exposed to atmosphere. The use of nitride layers3, 5, 24, 26 around the absorber layers 4 and 25 is advantageous in thatit helps prevent (or reduce the likelihood of) the absorption layers 4,25 from being oxidized during heat treatment, thereby better allowingthe absorption layers 4, 25 to perform an intended function, inparticular absorbing at least some amount (e.g., at least 5%, morepreferably at least 10%) of visible light. It will be appreciated thatif a layer becomes too oxidized during heat treatment or the like, it nolonger can function as an adequate absorption layer.

In certain example embodiments of this invention, absorption layers 4and 25 may be of or include NiCr (any suitable ratio or Ni:Cr), and mayor may not be nitrided (NiCrN_(x)). Absorption layers 4 and 25 arelocated between and contacting nitride based dielectric layers as shownin FIG. 1. In certain example embodiments, each of the nitride basedlayers 3, 5, 24, 26 surrounding the absorption layers 4, 25 is a nitridelayer and is substantially or entirely non-oxidized. In certain exampleembodiments, absorption layers 4, 25 may comprise from 0-10% oxygen,more preferably from 0-5% oxygen, and most preferably from 0-2% oxygen(atomic certain example embodiments, absorption layers 4, 25 comprisefrom 0-20% nitrogen, more preferably from 1-15% nitrogen, and mostpreferably from about 1-12% nitrogen (atomic %). While NiCr is apreferred material for the absorption layers 4 and 25, it is possiblethat other materials may instead be used. For example, in certain otherheat treatable example embodiments of this invention, the absorptionlayers 4 and/or 25 may be of or include Ni, Cr, NiCrN_(x), CrN, ZrN, orTiN. In non-heat treatable embodiments, any of the aforesaid materialsmay be used far the absorption/absorbing layers 4 and/or 25, as well asother materials such as Ti, Zr, NiOx or the like.

The absorbing layers 4 and 25 of the low-E coating 30 are designed tocause the coating 30 to have a lower visible transmission, desirablecoloration, and low film side reflectance. In certain exampleembodiments, the metallic or substantially metallic absorbing layers(e.g., NiCr or NiCrN_(x)) 4 and 25 may each be from about 80-250angstroms (Å) thick, more preferably from about 100-210 angstroms (Å)thick, and most preferably from about 140-190 angstroms (Å) thick. Incertain example embodiments, the lower absorbing layer 4 may be slightlythinner than the upper absorbing layer 25. For example, in certainexample embodiments, the lower absorbing layer 4 may be from about 3-50angstroms (Å) thinner (more preferably from about 3-20 angstromsthinner) than the upper absorbing layer 25, in order to provide fordesirable optical characteristics of the coated article. In certainexample embodiments, each metallic or substantially metallic absorbinglayer 4, 25 is provided between first and second nitride layers (e.g.,silicon nitride based layers) 3, 5, 24, 26 in order to reduce or preventoxidation thereof during heat treatment (e.g., thermal tempering, heatbending, and/or heat strengthening) thereby permitting predictablecoloration, transmission, and reflectance values to be achievedfollowing heat treatment.

Thus, an absorbing layer 25 is provided in the upper stack (above theupper Ag based IR reflecting layer 19), and a second absorbing layer 4is provided in the lower stack (between the glass substrate 1 and thelower Ag based IR reflecting layer 9). Preferably, in certaindouble-silver embodiments (i.e., where the low-E coating has twoAg-based IR reflecting layers), no similar absorbing layer is providedin the center dielectric stack between a pair of nitride layers. Inother words, while absorber layers 4 and 25 are provided in lower andupper portions of the coating, there is no similar absorber layerbetween nitrides provided in the center stack between the two Ag basedlayers 9 and 19. It has been found that the use of such absorbing layers4 and 25 in the bottom and top portions of the coating respectively, butnot in the middle part of the coating between the silvers, surprisinglyand unexpectedly allows for a combination of low visible transmissionand low film side reflectance to be simultaneously realized in thecoated article including coating 30. In certain example embodiments, thecoated article's visible film side reflectance (RfY) may be less thanits visible glass side reflectance (RgY), in IG and/or monolithicapplications.

Dielectric layers 3, 5, 14, 24 and 26 may be of or include siliconnitride in certain embodiments of this invention. Silicon nitride layers3, 5, 14, 24 and 26 may, among other things, improve heat-treatabilityof the coated articles and protect the absorbing layers during optionalHT, e.g., such as thermal tempering or the like. One or more of thesilicon nitride of layers 3, 5, 14, 24 and 26 may be of thestoichiometric type (i.e., Si₃N₄), or alternatively of the Si-rich typeof silicon nitride in different embodiments of this invention. Thepresence of free Si in a Si-rich silicon nitride inclusive layer 3and/or 5 may allow certain atoms such as sodium (Na) which migrateoutwardly from the glass 1 during HT to be more efficiently stopped bythe Si-rich silicon nitride inclusive layer(s) before they can reach thesilver 9 and damage the same. Thus, it is believed that the Si-richSi_(x)N_(y) can reduce the amount of damage done to the silver layer(s)during FIT in certain example embodiments of this invention therebyallowing sheet resistance (R_(s)) to decrease or remain about the samein a satisfactory manner. Moreover, it is believed that the Si-richSi_(x)N_(y) in layers 3, 5, 24 and/or 26 can reduce the amount of damage(e.g., oxidation) done to absorbing layer 4 (and/or 25) during HT incertain example optional embodiments of this invention. In certainexample embodiments, when Si-rich silicon nitride is used, the Si-richsilicon nitride layer as deposited may be characterized by Si_(x)N_(y)layer(s), where x/y may be from 0.76 to 1.5, more preferably from 0.8 to1.4, still more preferably from 0.82 to 1.2. Moreover, in certainexample embodiments, before and/or after HT the Si-rich Si_(x)N_(y)layer(s) may have an index of refraction “n” of at least 2.05, morepreferably of at least 2.07, and sometimes at least 2.10 (e.g., 632 nm)(note: stoichiometric Si₃N₄ which may also be used has an index “n” of2.02-2.04), it is noted that n and k tend to drop due to heat treatment.Any and/or all of the silicon nitride layers discussed herein may bedoped with other materials such as stainless steel or aluminum incertain example embodiments of this invention. For example, any and/orall silicon nitride layers discussed herein may optionally include fromabout 0-15% aluminum, more preferably from about 1 to 10% aluminum, incertain example embodiments of this invention. The silicon nitride maybe deposited by sputtering a target of Si or SiAl, in an atmospherehaving argon and nitrogen gas, in certain embodiments of this invention.Small amounts of oxygen may also be provided in certain instances in thesilicon nitride layers.

Infrared (IR) reflecting layers 9 and 19 are preferably substantially orentirely metallic and/or conductive, and may comprise or consistessentially of silver (Ag), gold, or any other suitable IR reflectingmaterial. IR reflecting layers 9 and 19 help allow the coating to havelow-E and/or good solar control characteristics. The IR reflectinglayers may, however, be slightly oxidized in certain embodiments of thisinvention.

The upper contact layers 11 and 21 may be of or include nickel (Ni)oxide, chromium/chrome (Cr) oxide, NiCr, or a nickel alloy oxide such asnickel chrome oxide (NiCrO_(x)), or other suitable material(s), incertain example embodiments of this invention. The use of, for example,NiCrO_(x) in these layers (11 and/or 21) allows durability to beimproved. The NiCrO_(x) of layers 11 and/or 21 may be fully oxidized incertain embodiments of this invention (i.e., fully stoichiometric), oralternatively may only be partially oxidized. In certain instances, theNiCrO_(x) layers 11 and/or 21 may be at least about 50% oxidized.Contact layers 11 and/or 21 (e.g., of or including an oxide of Ni and/orCr) may or may not be oxidation graded in different embodiments of thisinvention. Oxidation grading means that the degree of oxidation in thelayer changes throughout the thickness of the layer so that for examplea contact layer may be graded so as to be less oxidized at the contactinterface with the immediately adjacent IR reflecting layer than at aportion of the contact layer(s) further or more/most distant from theimmediately adjacent IR reflecting layer. Descriptions of various typesof oxidation graded contact layers are set forth in U.S. Pat. No.6,576,349, the disclosure of which is hereby incorporated herein byreference. Contact layers 11 and/or 21 (e.g., of or including an oxideof Ni and/or Cr) may or may not be continuous in different embodimentsof this invention across the entire IR reflecting layer.

Dielectric layers 13 and 23 may be of or include tin oxide in certainexample embodiments of this invention. However, as with other layersherein, ether materials may be used in different instances.

Lower contact layers 7 and/or 17 in certain embodiments of thisinvention are of or include zinc oxide (e.g., ZnO). The zinc oxide oflayers 7 and 17 may contain other materials as well such as Al (e.g., toform ZnAlO_(x)). For example, in certain example embodiments of thisinvention, one or more of zinc oxide layers 7, 17 may be doped with fromabout 1 to 10% Al, more preferably from about 1 to 5% Al, and mostpreferably about 1 to 4% Al.

Interlayer 15 of or including tin oxide is provided under IR reflectinglayer 19 so as to be located between silicon nitride layer 14 and zincoxide layer 17. The use of such a tin oxide inclusive interlayer 15results in numerous improvements compared to a situation where the layeris not provided. For example, it has been found that the use of such atin oxide inclusive interlayer 15 results it a coated article which iscapable of realizing: (a) less visible transmission shift due to heattreatment, (b) higher visible transmission following heat treatment; (c)less shifting of certain color value(s) due to heat treatment, (d)substantially neutral coloration following heat treatment; (e) morestable, or even decreasing, sheet resistance due to heat treatment, (f)lower sheet resistance and thus lower emissivity following heattreatment, (g) improved haze characteristics following heat treatment,and/or (h) improved mechanical durability such as scratch resistancebefore and/or after heat treatment. Thus, in certain example embodimentsof this invention, coated articles may be taken to higher temperaturesduring heat treatment and/or for longer times without sufferingundesirable significant transmission drops and/or increases in sheetresistance. In certain alternative embodiments, it is possible to dopethe tin oxide of layer 15 with other materials such as Al, Zn or thelike. Alternatively, other metal oxide(s) may be used for layer 15 incertain instances.

Dielectric layer 6 may be of or include titanium oxide in certainexample embodiments of this invention. The titanium oxide layer may beof or include TiO₂, or any other suitable stoichiometry in differentexample embodiments.

Other layer(s) below or above the illustrated coating may also beprovided. Thus, while the layer system or coating is on or “supportedby” substrate 1 (directly or indirectly), other layer(s) may be providedtherebetween. Thus, for example, the coating of FIG. 1 may be considered“on” and “supported by” the substrate 1 even if other layer(s) areprovided between layer 3 and substrate 1. Moreover, certain layers ofthe illustrated coating may be removed in certain embodiments, whileothers may be added between the various layers or the various layer(s)may be split with other layer(s) added between the split sections inother embodiments of this invention without departing from the overallspirit of certain embodiments of this invention.

While various thicknesses and materials may be used in layers indifferent embodiments of this invention, example thicknesses andmaterials for the respective layers on the glass substrate 1 in the FIG.1 embodiment are as follows, from the glass substrate outwardly:

Example Materials/Thicknesses; FIG. 1 Embodiment

Layer Preferred More Glass (1-10 mm thick) Range ({acute over (Å)})Preferred ({acute over (Å)}) Example (Å) Si_(x)N_(y) (layer 3) 40-250 Å100-200 Å 140 Å NiCr (layer 4) 100-220 Å 120-200 Å 159 Å Si_(x)N_(y)(layer 5) 40-450 Å 70-300 Å 210 Å TiO_(x) (layer 6) 60-300 {acute over(Å)} 100-200 {acute over (Å)} 150 Å ZnO_(x) (layer 7) 10-300 {acute over(Å)} 60-150 {acute over (Å)} 100 Å Ag (layer 9) 50-200 {acute over (Å)}60-110 {acute over (Å)} 84 Å NiCrO_(x) (layer 11) 10-100 {acute over(Å)} 12-40 {acute over (Å)} 30 Å SnO₂ (layer 13) 0-1,000 Å 200-700 Å 240Å Si_(x)N_(y) (layer 14) 50-450 {acute over (Å)} 80-200 {acute over (Å)}110 Å SnO₂ (layer 15) 30-250 Å 50-200 Å 80 Å ZnO_(x) (layer 17) 10-300{acute over (Å)} 40-130 {acute over (Å)} 60 Å Ag (layer 19) 50-200{acute over (Å)} 70-180 {acute over (Å)} 91 Å NiCrO_(x) (layer 21)10-100 {acute over (Å)} 20-45 {acute over (Å)} 30 Å SnO₂ (layer 23)0-750 Å 30-180 Å 80 Å Si₃N₄ (layer 24) 40-240 {acute over (Å)} 60-160{acute over (Å)} 90 Å NiCr (layer 25) 10-60 Å 12-30 Å 17 Å Si_(x)N_(y)(layer 26) 40-450 Å 70-300 Å 120 Å

It can be seen that the bottom absorber layer 4 is substantially thickerthan the upper absorber layer 25. For example, in certain embodimentsthe bottom absorber layer 4 is at least 40 Å thicker than the upperabsorber layer 25, more preferably at least 60 Å thicker, and even morepreferably at least 80 Å thicker. Also, it can be seen that for one orboth of the absorber layers 4 and/or 25, the bottom silicon nitridelayer (3 and/or 24) is thinner than the top silicon nitride layer (5and/or 26). For example, surrounding absorber layer 4 and/or 25, incertain embodiments the bottom silicon nitride layer (3 and/or 24) is atleast 10 Å thinner than the top silicon nitride layer (5 and/or 26),more preferably at least about 20 Å or 30 Å thinner.

In certain example embodiments of this invention, coated articles hereinmay have the following optical and solar characteristics set forth inTable 2 when measured monolithically. The sheet resistances (R_(s))herein take into account all IR reflecting layers (e.g., silver layers9, 19).

Optical/Solar Characteristics (Monolithic; Pre-HT)

Characteristic General More Preferred Most Preferred R_(s) (ohms/sq.):<=3.5  <=2.5  <=2.2  E_(n): <=0.07 <=0.04 <=0.03 T_(vis) (Ill. C. 2°):20-50% 20-43% 24-33% R_(f)Y (Ill. C., 2 deg.): <=15% <=12% <=11% R_(g)Y(Ill. C., 2 deg.): <=25% <=22% <=22%

In certain example embodiments, coated articles herein may have thefollowing characteristics, measured monolithically for example, afterheat treatment (HT):

Optical/Solar Characteristics (Monolithic; Post-HT)

Characteristic General More Preferred Most Preferred R_(s) (ohms/sq.):<=3.0  <=2.1  <=1.9  E_(n): <=0.07 <=0.04 <=0.03 T_(vis) (Ill. C. 2°):20-50% 20-43% 24-33% R_(f)Y (Ill. C., 2 deg.): <=15% <=12% <=11% R_(g)Y(Ill. C., 2 deg.): <=25% <=22% <=22%

Moreover, in certain example laminated embodiments of this invention,coated articles herein which have been optionally heat treated to anextent sufficient for tempering, and which have been coupled to anotherglass substrate to form an IG unit, may have the following IG unitoptical/solar characteristics in a structure as shown in FIG. 2 (e.g.,where the two glass sheets are 4 mm thick and 6 mm thick respectively ofclear glass with a 16 mm gap therebetween filled with 90/10 argon/air).It can be seen that the film side reflection increases when placed in anIG window unit.

Example Optical Features (IG Unit Pre or Post-HT)

Characteristic General More Preferred T_(vis) (or TY)(Ill. C. 2°):18-45% 20-31% a*_(t) (Ill. C. 2°):   −8 to +1.0  −6 to 0.0 b*_(t) (Ill.C. 2°): −17 to +5  −15 to +2  R_(f)Y (Ill. C., 2 deg.): <=20% <=16%a*_(f) (Ill. C., 2°):  −3 to +10   0 to +7 b*_(f) (Ill. C., 2°):   −26to +10.0 −22 to 0    R_(g)Y (Ill. C., 2 deg.): 10-30% 15-25% a*_(g)(Ill. C., 2°): −7 to +4 −5 to +1 b*_(g) (Ill. C., 2°): −12 to +5  −8 to0  

The following examples are provided for purposes of example only, andare not intended to be limiting unless specifically claimed.

EXAMPLES

The following Example 1 was made via sputtering on 6 mm thick clearglass substrate so as to have approximately the layer stack set forthbelow. Example 1 is according to example embodiments of this inventionas shown in FIG. 1, whereas the Comparative Example (CE) below has anNiCr absorbing layer only in the middle of the stack and is provided forpurposes of comparison. Example 1 had approximately the following layerstack, where the thicknesses are in units of angstroms (Å), and the NiCrabsorbing layers 4 and 25 were slightly nitrided.

Example 1

Layer Glass (6 mm thick) Thickness ({acute over (Å)}) Si_(x)N_(y) (layer3) 140 Å NiCr (layer 4) 159 Å Si_(x)N_(y) (layer 5) 210 Å TiO_(x) (layer6) 150 {acute over (Å)} ZnO_(x) (layer 7) 100 {acute over (Å)} Ag (layer9) 84 {acute over (Å)} NiCrO_(x) (layer 11) 30 {acute over (Å)} SnO₂(layer 13) 240 Å Si_(x)N_(y) (layer 14) 110 {acute over (Å)} SnO₂ (layer15) 80 Å ZnO_(x) (layer 17) 60 {acute over (Å)} Ag (layer 19) 91 {acuteover (Å)} NiCrO_(x) (layer 21) 30 {acute over (Å)} SnO₂ (layer 23) 80 ÅSi_(x)N_(y) (layer 24) 90 Å NiCr (layer 25) 17 Å Si₃N₄ (layer 26) 120{acute over (Å)}

The Comparative Example (CE) had a NiCr absorbing layer similar to thosein Example 1, but in the CE the absorbing layer was located only in themiddle stack between the silver layers. The CE had the following layerstack from the glass outwardly.

Comparative Example

Layer Glass (6 mm thick) Thickness ({acute over (Å)}) Si_(x)N_(y) 257 ÅZnO_(x) 100 {acute over (Å)} Ag 77 {acute over (Å)} NiCrO_(x) 25 {acuteover (Å)} SnO₂ 530 Å Si_(x)N_(y) 120 Å NiCr 134 Å Si_(x)N_(y) 151 {acuteover (Å)} SnO₂ 80 Å ZnO_(x) 80 {acute over (Å)} Ag 197 {acute over (Å)}NiCrO_(x) 25 {acute over (Å)} SnO₂ 142 Å Si_(x)N_(y) 210 Å

Set forth below are the optical characteristics of Example 1 compared tothose of the Comparative Example (CE), measured monolithically.

Comparison Between Example 1 and Comparative Example

Characteristic Ex. 1 Comparative Example T_(vis) (or TY)(Ill. C. 2°):28.9% 41.5% a*_(t) (Ill. C. 2°): −4.5 −7.0 b*_(t) (Ill. C. 2°): −13.8−2.5 R_(f)Y (Ill. C., 2 deg.):   9% 32.3% a*_(f) (Ill. C., 2°): +5.4+6.5 b*_(f) (Ill. C., 2°): −19.6 +11.0 R_(g)Y (Ill. C., 2 deg.): 19.1%14.5% a*_(g) (Ill. C., 2°): −3.0 −2.1 b*_(g) (Ill. C., 2°): −6.1 −10.2R_(s) (ohms/square): 1.8 1.1

It can be seen from the above that Example 1 had surprisingly superior(lower) visible film side reflectance (R_(f)Y) than the ComparativeExample (CE), even though Example 1 also had lower visible transmission(TY) than the CE, namely 9% in Example 1 compared to 32.3% in the CE.Thus, absorbing layers 4 and 25 in the lower and upper portions of thelow-E coating in Example 1 (as opposed to only in the center portion asin the CE) surprisingly caused the low-E coating to have a combinationof both (i) a low visible transmission, and GO low visible film sidereflectance.

In certain example embodiments of this invention, there is provided acoated article including a coating 30 supported by a glass substrate 1,the coating comprising: first and second infrared (IR) reflecting layerscomprising silver 9 and 19, wherein said IR reflecting layers 9 and 19are spaced apart from one another by at least one dielectric layer (13,14, 15 and/or 16) that is located therebetween, and wherein the first IRreflecting layer 9 is located closer to the glass substrate 1 than isthe second IR reflecting layer 19; a first substantially metallic ormetallic absorption layer comprising Ni and/or Cr 4 located such thatthe first absorption layer 4 is located between the glass substrate 1and the first IR reflecting layer 9, a second substantially metallic ormetallic absorption layer comprising Ni and/or Cr 25 located such thatboth the first and second IR reflecting layers 9 and 19 are locatedbetween the glass substrate 1 and the second absorption layer 25, andwherein the first absorption layer 4 and the second absorption layer 25are each sandwiched between and contacting dielectric layers comprisingsilicon nitride (3, 5; 24, 26).

In the coated article of the immediately preceding paragraph, said firstand second absorption layers may each comprise NiCr and/or NiCrN_(x).

In the coated article of any of the preceding two paragraphs, said firstand/or second absorption layers may each comprise from 1-15% nitrogen(atomic %).

In the coated article of any of the preceding three paragraphs, saidfirst and second IR reflecting layers 9, 19 may be spaced apart by atleast, moving away from the glass substrate: a layer comprising tinoxide 13, a layer comprising silicon nitride 14 and a layer comprisingzinc oxide 17.

In the coated article of any of the preceding four paragraphs, incertain example embodiments there no metallic or substantially metallicabsorption layer between the first and second IR reflecting layers.

In the coated article of any of the preceding five paragraphs, incertain example embodiments only two IR reflecting layers comprisingsilver are contained in the coating.

In the coated article of any of the preceding six paragraphs, the firstabsorption layer may be from about 120-200 angstroms (Å) thick.

In the coated article of any of the preceding seven paragraphs, thesecond absorption layer may be from about 12-30 angstroms (Å) thick.

In the coated article of any of the preceding eight paragraphs, thefirst absorption layer 4 may be substantially thicker than the secondabsorption layer 25.

In the coated article of any of the preceding nine paragraphs, saidcoated article may have a visible transmission of from about 20-43%(more preferably from about 24-33%), measured monolithically.

In the coated article of any of the preceding ten paragraphs, the coatedarticle may be heat treated (e.g., thermally tempered) or not heattreated.

In the coated article of any of the preceding eleven paragraphs, incertain example embodiments the coating contains no more than twometallic or substantially metallic absorption layers comprising NiCr orNiCrN_(x).

In the coated article of any of the preceding twelve paragraphs, thecoating may further comprises a layer comprising titanium oxide 6located between the first IR reflecting layer 9 and the first absorptionlayer 4.

In the coated article of any of the preceding thirteen paragraphs, saidfirst IR reflecting layer 9 and said first absorption layer 4 may bespaced apart by at least, moving away from the glass substrate: thelayer comprising silicon nitride 5 that is located over and directlycontacting the first absorption layer 4, a layer comprising titaniumoxide 6, and a layer comprising zinc oxide 7.

In the coated article of any of the preceding fourteen paragraphs, thecoated article may have a visible film side reflectance (RfY), measuredmonolithically, of less than or equal to 15%, more preferably less thanor equal to 12%.

In the coated article of any of the preceding fifteen paragraphs, thecoated article may have a visible film side reflectance (RfY) that isless than a visible glass side reflectance (RgY) of the coated article,measured monolithically; e.g., a visible film side reflectance (RfY)that is at least 5% points less than a visible glass side reflectance(RgY) of the coated article.

In certain example embodiments of this invention, there is provided acoated article including a coating supported by a glass substrate, thecoating comprising: first and second infrared (IR) reflecting layers,wherein said IR reflecting layers are spaced apart from one another byat least one dielectric layer that is located therebetween, and whereinthe first IR reflecting layer is located closer to the glass substratethan is the second IR reflecting layer; a first substantially metallicor metallic absorption layer located such that the first absorptionlayer is located between the glass substrate and the first IR reflectinglayer, a second substantially metallic or metallic absorption layerlocated such that both the first and second IR reflecting layers arelocated between the glass substrate and the second absorption layer, andwherein the first absorption layer and the second absorption layer areeach sandwiched between and contacting dielectric layers comprisingsilicon nitride.

In the coated article of the immediately preceding paragraph, said firstand second absorption layers may each comprise or consist essentially ofNiCr and/or NiCrN_(x).

In the coated article of any of the preceding two paragraphs, said firstand/or second absorption layers may each comprise from 1-15% nitrogen(atomic %).

In the coated article of any of the preceding three paragraphs, saidfirst and second IR reflecting layers may be spaced apart by at least,moving away from the glass substrate: a layer comprising tin oxide, alayer comprising silicon nitride and a layer comprising zinc oxide.

In the coated article of any of the preceding four paragraphs, incertain example embodiments there no metallic or substantially metallicabsorption layer between the first and second IR reflecting layers.

In the coated article of any of the preceding five paragraphs, incertain example embodiments only two IR reflecting layers comprisingsilver and/or gold are contained in the coating.

In the coated article of any of the preceding six paragraphs, the firstabsorption layer may be from about 120-200 angstroms (Å) thick.

In the coated article of any of the preceding seven paragraphs, thesecond absorption layer may be from about 12-30 angstroms (Å) thick.

In the coated article of any of the preceding eight paragraphs, thefirst absorption layer 4 may be substantially thicker than the secondabsorption layer 25.

In the coated article of any of the preceding nine paragraphs, saidcoated article may have a visible transmission of from about 20-43%(More preferably from about 24-33%), measured monolithically.

In the coated article of any of the preceding ten paragraphs, the coatedarticle may be heat treated (e.g., thermally tempered) or not heattreated.

In the coated article of any of the preceding eleven paragraphs, incertain example embodiments the coating may contain no more than twometallic or substantially metallic absorption layers (note: Ag or Au IRreflecting layers herein are IR reflecting layers not absorptionlayers).

In the coated article of any of the preceding twelve paragraphs, thecoating may further comprises a layer comprising titanium oxide locatedbetween the first ER reflecting layer and the first absorption layer.

In the coated article of any of the preceding thirteen paragraphs, saidfirst IR reflecting layer and said first absorption layer may be spacedapart by at least, moving away from the glass substrate: the layercomprising silicon nitride that is located over and directly contactingthe first absorption layer, a layer comprising titanium oxide, and alayer comprising zinc oxide.

In the coated article of any of the preceding fourteen paragraphs, thecoated article may have a visible film side reflectance (RfY), measuredmonolithically, of less than or equal to 15%, more preferably less thanor equal to 12%.

In the coated article of any of the preceding fifteen paragraphs, thecoated article may have a visible film side reflectance (RfY) that isless than a visible glass side reflectance (RgY) of the coated article,measured monolithically; e.g., a visible film side reflectance (RfY)that is at least 5% points less than a visible glass side reflectance(RgY) of the coated article.

While the invention has been described in connection with what ispresently considered to be the most practical and preferred embodiment,it is to be understood that the invention is not to be limited to thedisclosed embodiment, but on the contrary, is intended to cover variousmodifications and equivalent arrangements included within the spirit andscope of the appended claims.

The invention claimed is:
 1. A coated article including a coatingsupported by a glass substrate, the coating comprising: first and secondinfrared (IR) reflecting layers comprising silver, wherein said IRreflecting layers are spaced apart from one another by at least onedielectric layer that is located therebetween, and wherein the first IRreflecting layer is located closer to the glass substrate than is thesecond IR reflecting layer; a first absorption layer comprising Zrlocated such that the first absorption layer is located between theglass substrate and the first IR reflecting layer, a second absorptionlayer comprising Zr located such that both the first and second IRreflecting layers are located between the glass substrate and the secondabsorption layer, wherein the first absorption layer and the secondabsorption layer are each sandwiched between and contacting dielectriclayers; wherein each of the first and second absorption layers comprisesfrom 0-10% oxygen (atomic %) and from 1-15% nitrogen (atomic %); whereinsaid coated article has a visible transmission of from 20-43%, measuredmonolithically; and wherein, measured monolithically, the coated articlehas a visible film side reflectance (R_(f)Y) that is lower than itsvisible glass side reflectance (R_(g)Y).
 2. The coated article of claim1, wherein said first and second IR reflecting layers are spaced apartby at least, moving away from the glass substrate: a layer comprisingtin oxide, a layer comprising silicon nitride and a layer comprisingzinc oxide.
 3. The coated article of claim 1, wherein only two IRreflecting layers comprising silver are contained in the coating.
 4. Thecoated article of claim 1, wherein said coated article has a visibletransmission of from 24-33%, measured monolithically.
 5. The coatedarticle of claim 1, wherein the coated article is thermally tempered. 6.The coated article of claim 1, wherein the coating further comprises alayer comprising titanium oxide located between the first IR reflectinglayer and the first absorption layer.
 7. The coated article of claim 1,wherein said first IR reflecting layer and said first absorption layerare spaced apart by at least, moving away from the glass substrate: alayer comprising silicon nitride that is located over and directlycontacting the first absorption layer, a layer comprising titaniumoxide, and a layer comprising zinc oxide.
 8. The coated article of claim1, wherein the coated article has a visible film side reflectance (RfY),measured monolithically, of less than or equal to 15%.
 9. A coatedarticle including a coating supported by a glass substrate, the coatingcomprising: first and second infrared (IR) reflecting layers comprisingsilver, wherein said IR reflecting layers are spaced apart from oneanother by at least one dielectric layer that is located therebetween,and wherein the first IR reflecting layer is located closer to the glasssubstrate than is the second IR reflecting layer; a first absorptionlayer comprising NiCr located such that the first absorption layer islocated between the glass substrate and the first IR reflecting layer, asecond absorption layer comprising NiCr located such that both the firstand second IR reflecting layers are located between the glass substrateand the second absorption layer, wherein the first absorption layer andthe second absorption layer are each sandwiched between and contactingdielectric layers; wherein each of the first and second absorptionlayers comprises from 0-10% oxygen (atomic %) and from 1-15% nitrogen(atomic %); wherein said coated article has a visible transmission offrom 20-43%, measured monolithically; and wherein, measuredmonolithically, the coated article has a visible film side reflectance(R_(f)Y) that is lower than its visible glass side reflectance (R_(g)Y).10. The coated article of claim 9, wherein said first and second IRreflecting layers are spaced apart by at least, moving away from theglass substrate: a layer comprising tin oxide, a layer comprisingsilicon nitride and a layer comprising zinc oxide.
 11. The coatedarticle of claim 9, wherein only two IR reflecting layers comprisingsilver are contained in the coating.